Challenges associated with advanced mask cleaningGRENON, Brian J.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661K.1-81661K.11, 2Conference Paper

Evaluation of the Accuracy of Complex Illuminator DesignsHIBBS, Michael S; TIRAPU-AZPIROZ, Jaione; SEKI, Kazunori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660W.1-81660W.10, 2Conference Paper

Yield optimization through MLR techniquesPHILIPPE, Morey-Chaisemartin; BEISSER, Eric.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663H.1-81663H.4, 2Conference Paper

Photomask technology 2011 (19-22 September 2011, Monterey, California, United States)Maurer, Wilhelm; Abboud, Frank E.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 2 vol, 2, isbn 978-0-8194-8791-9Conference Proceedings

CD Error Budget of CP ExposureKUROKAWA, Masaki; ISOBE, Hideaki; TAKIZAWA, Masahiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816623.1-816623.7, 2Conference Paper

Clean and Repair of EUV PhotomasksROBINSON, Tod; YI, Daniel; BRINKLEY, David et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661J.1-81661J.10, 2Conference Paper

Mask Industry Assessment: 2011CHAN, Y. David.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660D.1-81660D.13, 2Conference Paper

Printability and Detection of Backside Defects on PhotomasksGUOXIANG NING; HOLFELD, Christian; TCHIKOULAEVA, Anna et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81664D.1-81664D.15, 2Conference Paper

The Influence and Improvement of Through Pellicle Image PlacementWEI CYUAN LO; YUNG FENG CHENG; MING JUI CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663A.1-81663A.7, 2Conference Paper

A new source optimization approach for 2X node logicIWASE, Kazuya; DE BISSCHOP, Peter; LAENENS, Bart et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662A.1-81662A.11, 2Conference Paper

Addressing 3D metrology challenges by using a multiple detector CDSEMHIROYAMA, Mitsuo; MURAKAWA, Tsutomu; YONEKURA, Isao et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661R.1-81661R.12, 2Conference Paper

Advanced electron beam resist requirements and challengesJAMIESON, Andrew; YONG KWAN KIM; OLSON, Bennett et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816616.1-816616.15, 2Conference Paper

Anticipation of dimensional issues caused by topography during photo lithographyRAVEL, Lionel; BRAULT, Christophe; HEGARET, Chloé et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663J.1-81663J.10, 2Conference Paper

Development status of EUVL mask blank and substrateHIRABAYASHI, Yusuke.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663T.1-81663T.6, 2Conference Paper

Efficiency and Throughput Improvement on Defect Disposition through Automated Defect ClassificationLIN HE; CORCORAN, Noel; ONG, B. H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661I.1-81661I.10, 2Conference Paper

Imprint lithography template technology for bit patterned media (BPM)LILLE, J; PATEL, K; RUIZ, R et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816626.1-816626.6, 2Conference Paper

Nanomachining Repair for the Latest Reticle Enhancement TechnologiesROBIAISON, Tod; YI, Daniel; BRINKLEY, David et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662Y.1-81662Y.10, 2Conference Paper

The trade-offs between thin and thick absorbers for EUV photomasksMCLNTYRE, Gregory; ZUNIGA, Christian; GALLAGHER, Emily et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663U.1-81663U.14, 2Conference Paper

Accelerating EUV learning with synchrotron light: Mask roughness challenges aheadNAULLEAU, Patrick P; GOLDBERG, Kenneth A; GULLIKSON, Eric et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660F.1-81660F.7, 2Conference Paper

Effect of SPM-based cleaning POR on EUV mask performanceCHOI, Jaehyuck; LEE, Han-Shin; SHIN, Inkyun et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661M.1-81661M.14, 2Conference Paper

Effects of Cleaning on NIL Templates: Surface Roughness, CD and Pattern IntegritySINGH, Sherjang; ONUKI, Kenji; KAWAMATA, Naoshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662P.1-81662P.7, 2Conference Paper

Electron beam EUV patterned mask inspection systemYARNADA, Keizo; KITAYAMA, Yasunobu; FIEKOWSKY, Peter et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662W.1-81662W.6, 2Conference Paper

Mask Replication using Jet and Flash Imprint LithographySELINIDIS, Kosta S; JONES, Chris; DOYLE, Gary F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816627.1-816627.12, 2Conference Paper

Optimized Qualification Protocol on Particle Cleanliness for EUV Mask InfrastructureDER DONCK, J. C. J. Van; STORTELDER, J. K; DERKSEN, G. B et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662T.1-81662T.8, 2Conference Paper

Phase-shifting Effect of Thin-absorber EUV MasksTANABE, Hiroyoshi; MURACHI, Tetsunori; LEE, Sang H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816618.1-816618.9, 2Conference Paper